Method for designing phase-shifting masks with automatization ca

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

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430 30, G03F 900

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055388159

ABSTRACT:
A method for designing a phase-shifting mask in a manner that a phase shifter of the mask is arranged so that a phase difference between light transmitted through clear areas with the phase shifter and light transmitted through clear areas without the phase shifter is set to 180.degree. or further different combination of phase differences being such as 0.degree., 90.degree. and 270.degree.. The method includes the steps of: defining a threshold value in a manner that the threshold value falls within a range which is possible to resolve using the phase-shifting masks; measuring a distance between neighboring shapes of the clear area; storing adjacent relationship of the neighboring shapes whose distance is less than the threshold; and automatically placing the phase shifter on one of the neighboring shapes of the clear areas in a manner that mutually neighboring clear area have an opposite phase to each other.

REFERENCES:
Modeling Phase Shifting Maska (Andrew.R. Neureuther) BACUS Symposium Paper.
Levenson "What IS a Phase-Shifting Mask?", IBM Research Division, K32/802D.
Hirai et al., "Computer Aided Design for Automatic Phase Shifting Patterns (1)", Ext. Abst. 38th Spring Meeting, of the Japan Society of Applied Physics and Related Societies, 29p-ZC-16, p. 540 (Mar. 1991).
Hirai et al., "Automatic Pattern Generation System for Phase Shifting Mask", (Symposium on VLSI Technology Digest of Technical Papers), pp. 95-96 (May 1991).
Wong et al., "Investigating Phase-Shifting Mask Layout Issues Using a Cad Toolkit", Intl. Electron. Devies Meeting, pp. 705-708 (Dec. 1991).

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