Method for deposition of silicon

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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55 2, 55 12, 118723, 250281, 250283, B05D 306

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046649387

ABSTRACT:
An apparatus and method are provided for depositing silicon on a substrate in a deposition chamber wherein deposition of impurities can be effectively prevented. Impurities are ionized according to the invention to form impurity ions which are collected so as to prevent their deposition on the substrate.

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