Method for depositing thin layers of a material consisting of ch

Details Method for depositing thin layers of a material consisting of ch Method for depositing thin layers of a material consisting of ch

1996-07-29

1998-07-07

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of coating supply or source outside of primary...

4271263, 4272553, 4272552, 4272551, B05D 306, C23C 1424

Patent

active

057765561

ABSTRACT:
The invention concerns process for producing thin layers of a material containing chemical compounds between a metal from group IV A of the periodic system, nitrogen and oxygen. The optical and electrical properties of this material can be set within wide limits by means of small voids, without the need to alter the chemical composition. The material is suitable in particular for use as a selective radiation converter in the solar energy and power industry. Aside from other processes for its manufacture, it can be produced as a thin coating deposited on a substrate by means of reactive evaporation.

REFERENCES:
patent: 4098956 (1978-07-01), Blickensderfer et al.
patent: 4861669 (1989-08-01), Gillery
patent: 5336565 (1994-08-01), Muromachi et al.

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