Method for depositing thin film for element, and organic...

Electric lamp and discharge devices – With luminescent solid or liquid material – Solid-state type

Reexamination Certificate

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C428S917000

Reexamination Certificate

active

06995507

ABSTRACT:
The present invention concerns a method of forming one or more thin films on a substrate by depositing two or more materials by vacuum evaporation, comprising, depositing each material under such control that ni value of the each material is k±0.5 wherein k is a constant from 2 to 5, when relationship between a deposition position and a film thickness of a material i on the substrate is approximated by the following equation (1):in-line-formulae description="In-line Formulae" end="lead"?Di/D0i∝(L0/Li)3cosniθi  (1)in-line-formulae description="In-line Formulae" end="tail"?wherein L0is a distance from an evaporation source to a plane of the substrate in a perpendicular direction, D0iis a film thickness of the material i at an intersection point of a perpendicular line from the evaporation source to the plane of the substrate, and Diis a film thickness of the material i at a position on the substrate which is apart from the evaporation source by a distance Liin a direction of an angle θiagainst the perpendicular line. By the method, a homogenous thin film layer for an element can be formed even on a substrate having large screen.

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