Method for depositing material with nanometer dimensions

Details Method for depositing material with nanometer dimensions Method for depositing material with nanometer dimensions

1984-06-29

1985-09-03

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

29576R, 427 431, 430272, 430296, 430322, 430394, 430396, 430942, C23C 1500

Patent

active

045390894

ABSTRACT:
This method involves the deposition of free metal atoms (4) from the apex (5) of a pointed tip (1) supported at a distance of 10 to 20 nm from a substrate (2). The atoms (4) are being field-desorbed under the influence of a strong electric field existing between the tip (1) and the substrate (2). With the tip (1) being moved across the substrate (2), a narrow trace (6) of metal atoms will be deposited on the substrate.

REFERENCES:
patent: 3971860 (1976-07-01), Broers et al.
patent: 4197332 (1980-04-01), Broers et al.
patent: 4467026 (1984-08-01), Ogawa

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