Method for depositing a micron-size metallic film on a transpare

Details Method for depositing a micron-size metallic film on a transpare Method for depositing a micron-size metallic film on a transpare

1985-06-25

1986-08-19

Newsome, John H.

Coating processes

Electrical product produced

Welding electrode

427 541, C23C 1102

Patent

active

046069321

ABSTRACT:
A method for depositing a micron-size metallic film on a transparent substrate by thermal deposition employing a focused visible laser. The method includes the step of positioning the substrate in a gas cell containing a metal bearing gaseous compound. A nucleation layer is formed on a surface of the substrate by either shining an ultraviolet light on the substrate surface or by heating the substrate to a temperature which is less than the temperature at which the molecules of the gaseous compound decompose. Next, a laser which may be visible or near infrared is focused onto the substrate to provide localized heating of the area of the substrate to which the beam is incident. Molecules of the gaseous compound thermally decompose on the heated area to deposit a metal film thereon.

REFERENCES:
patent: 3271180 (1966-09-01), White
patent: 3364087 (1968-01-01), Solomon et al.
patent: 4042006 (1977-08-01), Engl et al.
patent: 4451503 (1984-05-01), Blum et al.
Tsao et al., Appl. Pats. Lett., vol. 45, No. 6, Sep. 1984, pp. 617-619.

Affiliated with

Also associated with

Rating

Method for depositing a micron-size metallic film on a transpare does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for depositing a micron-size metallic film on a transpare, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for depositing a micron-size metallic film on a transpare will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-393435