Method for depositing a hard, fine-grained, non-columnar alloy o

Coating processes – Coating by vapor – gas – or smoke – Carbon or carbide coating

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427255, 4272552, C23C 1632

Patent

active

048746428

ABSTRACT:
A method for producing the disclosed material comprises introducing into a chemical vapor deposition (CVD) reactor a mixture of process gases comprised essentially of (1) tungsten hexafluoride, (2) a volatile oxygen- and hydrogen-containing organic compound, and (3) hydrogen; controlling the ratio of the tungsten hexafluoride to the oxygen- and hydrogen-containing organic compound within the CVD reactor so that the W/C atomic ratio is within the range of about 0.5 to about 15; controlling the reaction temperature so it is within the range of above about 300.degree. to less than about 650.degree. C.; controlling the total pressure within the range of about 1 Torr. to about 1,000 Torr.; and controlling the ratio of H.sub.2 to WF.sub.6 within the range of about 4 to about 20; to produce W and W.sub.2 C, W and W.sub.3 C, or W and W.sub.2 C and W.sub.3 C.

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