Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1997-05-14
2000-10-17
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
427240, 427294, 427379, 427551, 427557, 427595, 437231, B29C 7102
Patent
active
061328146
ABSTRACT:
An electron beam exposure method is described which provides a means of curing spin-on-glass formed on a semiconductor wafer which insulates the conductive metal layer and planarizes the topography in the process of manufacturing multilayered integrated circuits. The method utilizes a large area, uniform electron beam exposure system in a soft vacuum environment. A wafer coated with uncured siloxane spin-on-glass is irradiated with electrons of sufficient energy to penetrate the entire thickness of the spin-on-glass and is simultaneously heated by infrared heaters. The wafer is exposed to a predetermined dose of electrons while simultaneously raised to a peak temperature in a soft vacuum environment. The electron beam and infrared heaters are then extinguished and the substrate cooled before removing from vacuum.
REFERENCES:
patent: 4041190 (1977-08-01), Dubois et al.
patent: 4222792 (1980-09-01), Lever et al.
patent: 4596720 (1986-06-01), Keryk et al.
patent: 4600685 (1986-07-01), Kitakohji et al.
patent: 4983546 (1991-01-01), Hyun et al.
patent: 5024969 (1991-06-01), Reche
patent: 5119164 (1992-06-01), Sliwa, Jr. et al.
patent: 5192697 (1993-03-01), Leong
patent: 5192715 (1993-03-01), Sliwa, Jr. et al.
patent: 5376586 (1994-12-01), Beilin et al.
Akira Imai et al., Novel Process for Direct Delineation of Spin on Glass (SOG). Jpn. J. Appl. Phys., vol. 29, No. 11, Nov. 1990, pp. 2653-2656.
N. Moriya et al., Modification Effects in Ion-Implanted SiO.sub.2 Spin-on-Glass. J. Electrochem. Soc., vol. 140, No. 5, May 1993, pp. 1442-1450.
Young-Bum Koh et al., Direct Patterning of Spin-on Glass by Focused Ion Beam Irradiation. Jpn. J. Appl. Phys., vol. 31, No. 12B, Dec. 1992, pp. 4479-4482.
Robert W. Christy, Formation of Thin Polymer by Electron Bombardment. J. Appl. Phys., vol. 31, No. 9, Sep. 1960, pp. 1680-1683.
N. Moriya et al., Large increase of refractive index and compactness in siloxane-type spin-on-glass induced by ion implantation, Appl. Phys. Lett. 57(2), Jul. 9, 1990, pp. 108-110.
W.W. Molzen et al., Materials and techniques use in nanostructure fabrication, J. Vac. Sci. Technol., 16(2), Mar./Apr. 1979, pp. 269-72.
S.S. Elovikov et al. Controlled formation of thin polymer films by electron radiation, Thin Solid Films, vol. 62, pp. 303-316 (1979) (no month avail.) .
Livesay William R.
Ross Matthew F.
Rubiales Anthony L.
Electron Vision Corporation
Heal Noel F.
Pianalto Bernard
LandOfFree
Method for curing spin-on-glass film utilizing electron beam rad does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for curing spin-on-glass film utilizing electron beam rad, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for curing spin-on-glass film utilizing electron beam rad will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-466113