Method for creating inductive write head with steep shoulder...

Details Method for creating inductive write head with steep shoulder... Method for creating inductive write head with steep shoulder...

2006-08-01

2006-08-01

Hassanzadeh, Parviz (Department: 1763)

Etching a substrate: processes

Forming or treating optical article

C438S003000

Reexamination Certificate

active

07083738

ABSTRACT:
A method for fabricating a magnetic head using a modified P1cap process. A first pole is formed. A cap is formed above the first pole. A gap layer is formed above the cap. A second pole is formed above the gap layer. Exposed portions of the gap layer are removed. The cap and first pole are milled for creating a shoulder of the first pole tapered upwardly towards the cap. Another method for fabricating a magnetic head includes forming a first pole, forming a gap layer above the first pole, forming a second pole above the gap layer, forming a layer of photoresist above the second pole, patterning the photoresist such that the photoresist covers areas of the gap layer positioned towards the second pole, removing exposed portions of the gap layer, removing part of exposed portions of the first pole for forming steps in the first pole on opposite sides of the photoresist, removing the photoresist, and milling for creating a shoulder of the first pole tapering upwardly towards the cap.

REFERENCES:
patent: 6119331 (2000-09-01), Chang et al.
patent: 2001/0055879 (2001-12-01), Sasaki

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