Etching a substrate: processes – Forming or treating article containing magnetically...
Reexamination Certificate
2008-12-23
2011-11-29
Tran, Binh X (Department: 1713)
Etching a substrate: processes
Forming or treating article containing magnetically...
C216S039000, C360S313000, C360S319000
Reexamination Certificate
active
08066893
ABSTRACT:
A method for manufacturing a magnetic write head having a stepped, recessed, high magnetic moment pole connected with a write pole. The stepped pole structure helps to channel magnetic flux to the write pole without leaking write field to the magnetic medium. This allows the write head to maintain a high write field strength at very small bit sizes. The method includes depositing a dielectric layer and a first CMP layer over substrate that can include a magnetic shaping layer. A mask is formed over the dielectric layer, the mask having an opening to define the stepped pole structure. The image of the mask is transferred into the dielectric layer. A high magnetic moment material is deposited and a chemical mechanical polishing is performed to planarize the magnetic material and dielectric layer.
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Baer Amanda
Hsiao Wen-Chien (David)
Kim John I.
Liu Yinshi
Nikitin Vladimir
Hitachi Global Storage Technologies - Netherlands B.V.
Pham Thomas
Tran Binh X
Zilka-Kotab, PC
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