Radiation imagery chemistry: process – composition – or product th – Stripping process or element – Forming nonplanar image
Patent
1985-09-18
1987-03-24
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Stripping process or element
Forming nonplanar image
430278, 430322, G03C 500
Patent
active
046525130
ABSTRACT:
A method is provided for acid etching or sandblasting decorative designs in the smooth surface of hard substrates such as glass, ceramics, plastics, and marble, granite, or other stones. A dry film photoresist, preferably a solder mask, is applied to the smooth surface without the addition of heat. The decorative design is placed on the dry film by exposing the dry film to ultraviolet light through a negative of the design to place the design on the surface of the photoresist. The dry film is then developed to remove a portion of it. The smooth surface is then acid etched or sandblasted, with the portion of the dry film remaining on the smooth surface protecting that portion of the smooth surface from the acid etching or sandblasting process. An apparatus is also provided for applying the dry film photoresist to the substrate.
REFERENCES:
patent: 1676637 (1928-07-01), Di Bona et al.
patent: 1840226 (1932-01-01), Chase
patent: 2129460 (1938-09-01), Bluem et al.
patent: 2206290 (1940-07-01), Meyer
patent: 2655909 (1953-10-01), Aitchison et al.
patent: 2776677 (1957-01-01), Paquette
patent: 3415699 (1968-12-01), Brown
patent: 3469982 (1969-09-01), Celeste
patent: 3515528 (1970-06-01), Luther et al.
patent: 3687750 (1972-08-01), Jamieson
patent: 3769113 (1973-10-01), Gruenke, Jr.
patent: 3822155 (1974-07-01), Feldstein et al.
patent: 3935117 (1976-01-01), Suzuki et al.
patent: 4159222 (1979-06-01), Lebow et al.
patent: 4193797 (1980-03-01), Cohen et al.
patent: 4253908 (1981-03-01), Stephen-Daly
patent: 4316766 (1982-02-01), Levin et al.
patent: 4321105 (1982-03-01), Melonio et al.
patent: 4379818 (1983-04-01), Lock et al.
patent: 4430416 (1984-02-01), Goto et al.
patent: 4436776 (1984-03-01), Wojcik
patent: 4451329 (1984-05-01), Batchelor et al.
patent: 4456680 (1984-06-01), Nakamura et al.
patent: 4530896 (1985-07-01), Christensen et al.
patent: 4544619 (1985-10-01), Christensen et al.
Dynachem.RTM. Model 300 Laminator brochure, (no date).
Dynachem.RTM. Model 120 Laminator brochure, (no date).
"A Guide to the Safe Handling and Use of Laminar.RTM. Products", technical data brochure, (11/83).
"Laminar FM Dry Film Solder Mask", technical data brochure, (no date).
"Two Decades of Technological Innovation", Dynachem.RTM. brochure, (3/83).
Burkes Dewey L.
Pentak William F.
Kittle John E.
Ryan Patrick J.
Vacuum Applied Coatings Corp.
LandOfFree
Method for creating a design in relief in a hard smooth substrat does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for creating a design in relief in a hard smooth substrat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for creating a design in relief in a hard smooth substrat will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1353763