Method for correcting placement errors in a lithography system

Details Method for correcting placement errors in a lithography system Method for correcting placement errors in a lithography system

1996-10-28

1998-06-30

Berman, Jack I.

Radiant energy

Means to align or position an object relative to a source or...

H01J 37304

Patent

active

057738360

ABSTRACT:
A method for correcting placement errors in a lithography system, and a system therefor, are disclosed. The method comprises the steps of obtaining metrology data of sufficient density to smoothly map an error to be corrected, deriving a metrology data grid coordinate system from the data, aligning the metrology data grid coordinate system to remove rigid body components, and for each of a plurality of lithographic fields: identifying a number of metrology sites nearest to the center of the field; establishing a reference grid coordinate system coinciding with the lithographic field; determining at least one correction factor which minimizes the residual errors; and applying at least one correction factor for at least one field to the first lithography system to correct a placement error. Such a method and system are particularly useful for error correction in e beam lithography tools.

REFERENCES:
patent: 4442361 (1984-04-01), Zasio et al.
patent: 4678919 (1987-07-01), Sugishima et al.
patent: 5301124 (1994-04-01), Chan et al.
patent: 5424548 (1995-06-01), Puisto

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