Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2007-10-09
2007-10-09
Young, Christopher G. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S005000, C430S311000, C716S030000, C716S030000
Reexamination Certificate
active
11102689
ABSTRACT:
A method for correcting pattern data is provided which is capable of making a proper correction to data of a pattern having a complicated layout. A correction is made to pattern data affected by a proximity effect when a pattern is formed on a photomask or wafer according to design data for a semiconductor device, by detecting, according to the design data, a space portion being placed on a photomask or wafer and having a specified size occurring between patterns facing each other in a first direction, by producing pattern data corresponding to an assist pattern that fills the space portion, by detecting an edge to be corrected in a position being opposite to an edge of the assist pattern extending in a second direction between the patterns facing each other, out of framing portions of the pattern being placed in parallel and near to the assist pattern, by making a correction being independent of a correction to be made to other edge of the framing portion to the detected edge to be corrected, and by removing the assist pattern.
REFERENCES:
Patent Abstracts of Japan, Publication No. 2003-195478, dated Jul. 9, 2003.
Patent Abstracts of Japan, Publication No. 2002-006477, dated Jan. 9, 2002.
Ishiwata Naoyuki
Ito Takahisa
Kushida Yasuyuki
Sakurai Mitsuo
Fujitsu Limited
Westerman, Hattori, Daniels & Adrian , LLP.
Young Christopher G.
LandOfFree
Method for correcting pattern data and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for correcting pattern data and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for correcting pattern data and method for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3893899