Method for correcting measured values resulting from the...

Details Method for correcting measured values resulting from the... Method for correcting measured values resulting from the...

2008-06-27

2010-11-02

Toatley, Gregory J (Department: 2877)

Optics: measuring and testing

Shape or surface configuration

C356S237200

Reexamination Certificate

active

07826068

ABSTRACT:
A method for correcting the measured values of positions of structures (3) on a substrate (2) resulting from bending of a substrate (2) is disclosed. A plurality of geometric parameters of the substrate (2) are determined. A plurality of physical parameters of the substrate (2) are determined. A degree of bending is calculated individually for each substrate (2) on the basis of the obtained geometric parameters, the physical parameters and the position of the support points (40). The measured position data of the structures (3) on the substrate (2) is corrected with the aid of each individually calculated degree of bending.

REFERENCES:
patent: 6347458 (2002-02-01), Kaczynski
patent: 6377870 (2002-04-01), Blaesing-Bangert et al.
patent: 6960755 (2005-11-01), Kaczynski
patent: 2005/0254068 (2005-11-01), Rinn et al.
patent: 2007/0103659 (2007-05-01), Yoshitake et al.
Blaesing, C., “Pattern Placement Metrology for Mask Making,” SEMI, Mar. 31, 1998.

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