Method for correcting layout with pitch change section

Details Method for correcting layout with pitch change section Method for correcting layout with pitch change section

2008-12-22

2011-10-25

Doan, Nghia (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Integrated circuit design processing

Logic design processing

C716S051000, C716S132000, C716S111000, C716S055000, C716S053000

Reexamination Certificate

active

08046723

ABSTRACT:
A method for correcting a layout with a pitch change section may include disposing a pattern layout with the pitch change section having a first pattern and a second pattern at a pitch relatively larger than that of the first pattern, measuring the pitch change from the pattern layout, a step of measuring an aerial image intensity by performing a simulation operation on the area with the pitch change section; modifying the pitch of the layout in the pitch change section based on a threshold intensity value at which the pattern is formed; and processing the layout correction to cause the pitch to exist within the threshold range by comparing the image intensity of the modified layout with the image intensity of the reference area.

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patent: 10-2006-0131860 (2006-12-01), None

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