Organic compounds -- part of the class 532-570 series – Organic compounds – Silicon containing
Patent
1986-10-07
1988-08-30
Shaver, Paul F.
Organic compounds -- part of the class 532-570 series
Organic compounds
Silicon containing
556411, 556412, 528 14, 528 21, 528 22, 528 28, 528 31, 528 32, 528 33, 528 34, 528 35, 528 38, C07F 708, C07F 710
Patent
active
047678763
ABSTRACT:
A method of forming preceramic polymers using an organosilicon polymer containing Si--H repeat units by reacting it with alkali metal amide or silylamide is disclosed. Preferably, the silylamide is a polymeric silylamide formed by reacting in solution anhydrous ammonia with a mixture of R.sup.1 SiHX.sub.2 (where R.sup.1 is a lower alkyl group having from 1 to about 6 carbon atoms, a substituted or unsubstituted cycloalkyl group having from 3 to about 6 carbon atoms, a substituted or unsubstituted lower alkenyl group having from 2 to about 6 carbon atoms or a substituted or unsubstituted lower aryl group having from 6 to about 10 carbon atoms; and X is a halogen) and R.sup.2 SiX.sub.3 (where R.sup.2 is H, a lower alkenyl group having from 1 to about 6 carbon atoms, a substituted or unsubstituted cycloalkyl group having from 3 to about 6 carbon atoms, a substituted or unsubstituted lower alkenyl group having from 2 to about 6 carbon atoms or a substituted or unsubstituted lower aryl group having from 6 to about 10 carbon atoms). The Si--H containing organosilicon polymer is preferably selected from the group consisting of organopolysilanes of the formula [(RSiH).sub.x (RSi).sub.y ].sub.n (where R is a lower alkyl group having from 1 to about 6 carbon atoms, a lower alkenyl group having from 2 to about 6 carbon atoms, or a substituted or unsubstituted lower aryl group having from 6 to about 10 carbon atoms, and n is greater than 1), a polycarbosilane having repeat units of the formula [R.sup.a Si(H)--(CH.sub.2).sub.q ] (where R.sup.a is H, a lower alkyl group having from 1 to about 6 carbon atoms, a cycloalkyl group having from 3 to about 6 carbon atoms, or a substituted or unsubstituted lower aryl group having from 6 to about 10 carbon atoms, q is an integer 1 or greater), and a polysiloxane having repeat units of the formula [R.sup.b Si(H)O].sub.n (where R.sup.b is a lower alkyl group having from 1 to about 6 carbon atoms, a cycloalkyl group having from 3 to about 6 carbon atoms, or a substituted or unsubstituted lower aryl group having from 6 to about 10 carbon atoms, and n is an integer greater than 1).
Novel preceramic polymers formed by this method are also disclosed.
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Schwark Joanne M.
Seyferth Dietmar
Yu Yuan-Fu
Eisenstein Ronald I.
Massachusetts Institute of Technology
Neuner George W.
Shaver Paul F.
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