Etching a substrate: processes – Nongaseous phase etching of substrate – Etching using radiation
Reexamination Certificate
2003-08-27
2008-11-18
Alanko, Anita K (Department: 1792)
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching using radiation
C438S746000
Reexamination Certificate
active
07452478
ABSTRACT:
This invention provides a method for converting materials for stabilizing surfaces of semiconductor nanoparticles. In this method, surfaces of semiconductor nanoparticles are first modified and then dissolved by photoetching in the presence of materials for stabilization to obtain nanoparticles that are stabilized in an aqueous solution.
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Kuwabata Susumu
Sato Keiichi
A. Marquez, Esq. Juan Carlos
Alanko Anita K
Fisher Esq. Stanley P.
Hitachi Software Engineering Co. Ltd.
Reed Smith LLP
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