Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2006-11-14
2006-11-14
Brewster, William M. (Department: 2823)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C438S143000, C438S310000, C438S471000, C438S473000, C438S795000
Reexamination Certificate
active
07135351
ABSTRACT:
The present invention is directed to a single crystal Czochralski-type silicon wafer, and a process for the preparation thereof, which has at least a surface layer of high resistivity, the layer having an interstitial oxygen content which renders it incapable of forming thermal donors in an amount sufficient to affect resistivity upon being subjected to a conventional semiconductor device manufacturing process. The present invention further directed to a silicon on insulator structure derived from such a wafer.
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Binns Martin J.
Falster Robert J.
Libbert Jeffrey L.
Brewster William M.
MEMC Electronic Materials , Inc.
Senniger Powers
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