Method for controlling linewidth in advanced lithography...

Details Method for controlling linewidth in advanced lithography... Method for controlling linewidth in advanced lithography...

2006-05-23

2006-05-23

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07049035

ABSTRACT:
A method for controlling the linewidth of a feature formed within an advanced lithography mask includes electrochemically depositing an additive material on exposed sidewalls of an etched first layer of the mask, wherein the top of the etched first layer remains covered by a hardmask used during the etching of the first layer. A second layer beneath the etched first layer is resistant to the electrochemical deposition of the additive material thereupon.

REFERENCES:
patent: 5707765 (1998-01-01), Chen
patent: 5780187 (1998-07-01), Pierrat et al.
patent: 5935733 (1999-08-01), Scott et al.
patent: 5935737 (1999-08-01), Yan
patent: 6139993 (2000-10-01), Lee et al.
patent: 6235434 (2001-05-01), Sweeney et al.
patent: 6309976 (2001-10-01), Lin et al.
patent: 6368762 (2002-04-01), Ling
patent: 6368974 (2002-04-01), Tsai et al.
patent: 6627362 (2003-09-01), Stivers et al.
patent: 6787460 (2004-09-01), Lee et al.
patent: 6797620 (2004-09-01), Lewis et al.
patent: 2002/0115000 (2002-08-01), Gupta et al.
patent: 2004/0091789 (2004-05-01), Han et al.

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