Method for controlling exposure and scan-exposure apparatus

Details Method for controlling exposure and scan-exposure apparatus Method for controlling exposure and scan-exposure apparatus

2005-01-04

2005-01-04

Nghiem, Michael (Department: 2863)

Incremental printing of symbolic information

Light or beam marking apparatus or processes

Scan of light

Reexamination Certificate

active

06839077

ABSTRACT:
The present invention relates to a method for controlling exposure and a scan-exposure apparatus, which are used when a photosensitive material is scan-exposed. In the present invention, distance between a light source and a recording medium can be controlled on the basis of pre-measured distance correction data and timing at which light is emitted from the light source can be controlled on the basis of pre-measured light-emission correction data. Accordingly, it becomes possible to prevent the light beam irradiates the recording medium from going out of focus and to reduce the amount by which the position irradiated with the light beam deviates from a preset standard position.

REFERENCES:
patent: 4435055 (1984-03-01), Berdat et al.
patent: 6025867 (2000-02-01), Buus
patent: 6075549 (2000-06-01), Bridges
patent: 6115056 (2000-09-01), Eshed
patent: 6165658 (2000-12-01), Taff et al.
patent: 6452664 (2002-09-01), Miwa
patent: 6559880 (2003-05-01), Ohba
patent: 20010026312 (2001-10-01), Ohba

Affiliated with

Also associated with

Rating

Method for controlling exposure and scan-exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for controlling exposure and scan-exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for controlling exposure and scan-exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3378277