Method for controlling chemical vapor deposition

Details Method for controlling chemical vapor deposition Method for controlling chemical vapor deposition

1976-06-07

1978-02-07

Hoffman, James R.

Coating processes

Measuring, testing, or indicating

427 10, C23C 1304, C01B 3312

Patent

active

040727670

ABSTRACT:
In forming a film of a purposive substance on a substrate by a chemical vapor deposition (CVD), the size of the film-forming substance particles formed in a reactor is detected as an electrical signal and flow rates of respective gases introduced into the reactor are controlled in response to this electrical signal. According to this control method, the fogging phenomenon owing to formation of the film-forming substance in the gas flow can be effectively prevented.

REFERENCES:
patent: 3607378 (1971-09-01), Ruggiero

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