Method for controlled hydrogen charging of metals

Chemistry of inorganic compounds – Hydrogen or compound thereof – Binary compound

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

420900, C01B 602

Patent

active

044514450

ABSTRACT:
A method for controlling hydrogen charging of hydride forming metals through a window of a superimposed layer of a non-hydriding metal overlying the portion of the hydride forming metals to be charged.

REFERENCES:
Pick et al., "Physical Review Letters", vol. 43, 1979, pp. 286-289.
Boes et al., "Zeit. fur Naturforschung," vol. 31a, 1976, pp. 754-759.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for controlled hydrogen charging of metals does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for controlled hydrogen charging of metals, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for controlled hydrogen charging of metals will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1396853

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.