Coating processes – Coating by vapor – gas – or smoke
Reexamination Certificate
2004-12-21
2008-08-19
Meeks, Timothy (Department: 1792)
Coating processes
Coating by vapor, gas, or smoke
Reexamination Certificate
active
07413774
ABSTRACT:
A vapor phase deposition method and apparatus for the application of thin layers and coatings on substrates. The method and apparatus are useful in the fabrication of electronic devices, micro-electromechanical systems (MEMS), Bio-MEMS devices, micro and nano imprinting lithography, and microfluidic devices. The apparatus used to carry out the method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. The apparatus provides for precise addition of quantities of different combinations of reactants during a single step or when there are a number of different individual steps in the coating formation process. The precise addition of each of the reactants in vapor form is metered into a predetermined set volume at a specified temperature to a specified pressure, to provide a highly accurate amount of reactant.
REFERENCES:
patent: 5480488 (1996-01-01), Bittner et al.
patent: 5576247 (1996-11-01), Yano et al.
patent: 5602671 (1997-02-01), Hornbeck
patent: 5626924 (1997-05-01), Ishikawa
patent: 5879459 (1999-03-01), Gadgil et al.
patent: 5966499 (1999-10-01), Hinkle et al.
patent: 5989345 (1999-11-01), Hatano
patent: 6203505 (2001-03-01), Jalisi et al.
patent: 6383642 (2002-05-01), Le Bellac et al.
patent: 6503330 (2003-01-01), Sneh et al.
patent: 6576489 (2003-06-01), Leung et al.
patent: 6743736 (2004-06-01), Mardian et al.
patent: 2001/0028924 (2001-10-01), Sherman
patent: 2002/0031618 (2002-03-01), Sherman
patent: 2002/0033229 (2002-03-01), Lebouitz et al.
patent: 2002/0076507 (2002-06-01), Chiang et al.
patent: 2002/0146725 (2002-10-01), Mullen et al.
patent: 2002/0164420 (2002-11-01), Derderian et al.
patent: 2002/0195950 (2002-12-01), Mikhael et al.
patent: 2003/0035904 (2003-02-01), Hsieh et al.
patent: 2003/0040173 (2003-02-01), Fonash et al.
patent: 2003/0138645 (2003-07-01), Gleason et al.
patent: 2003/0180458 (2003-09-01), Sneh
patent: 2004/0182316 (2004-09-01), Watanabe
patent: 2004/0261703 (2004-12-01), Kobrin et al.
patent: 2005/0081787 (2005-04-01), Im et al.
patent: 11116278 (1999-04-01), None
patent: WO 02/28956 (2002-04-01), None
Ashurst et al, Wafer level anti-stiction coatings for MEMS, Sensors and Actuators A 104, (2003), p. 213-221.
Mayer et al, Chemical vapor deposition of fluoroalkysilane monolayer films for adhesion control in microelectromechanical systems, J. Vac. Sci. technol. B 18(5), Sep./ Oct. 2000, p. 2433-2440.
W. R. Ashurst et al., “Wafer Level Anti-Stiction Coatings With Superior Thermal Stability”, Presentation at Hilton Head, South Caroline meeting, pp. 1-4 (Jun. 2002). Contact ashurbr@uclink4.berkeley.edu.
W. R. Ashurst et al., “Vapor Phase Anti-Stiction Monolayer Coatings for MEMS”, TDMR-Draft, pp. 1-6 (Sep. 2003).
W.R. Ashurst et al., “Wafer level anti-stiction coating for MEMS”, Sensors and Actuators A, Elsevier Science B.V., vol. 104, pp. 213-221 (2003).
M. V. Collins et al., “Optimization of Anodic Bonding to MEMS with Self-Assembled Monolayer (SAM) Coatings”, Reliability, Testing, and Characterization of MEMS/MOEMS, Proceedings of SPIE, vol. 4558, pp. 234-241 (2001).
M. G. Hankins, “Vapor Deposition of Amino-Functionalized Self-Assembled Monolayers on MEMS”, Reliability, Testing, and Characterization of MEMS/MOEMS, Proceedings of SPIE, vol. 4980, pp. 238-247 (2003).
S. A. Henck, “Lubrication of digital micromirror devices™”, Tribology Letters, vol. 3, pp. 239-247 (1997).
P. W. Hoffmann et al., “Vapor Phase Self-Assembly of Fluorinated Monolayers on Silicon and Germanium Oxide”, Langmuir, vol. 13, pp. 1877-1880 (1997).
A. Hozumi et al., “Amino-terminated self-assembled monolayer on a SIO2surface formed by chemical vapor deposition”, J. Vac. Sci. Technol. A, vol. 19, No. 4, pp. 1812-1816 (Jul./Aug. 2001).
X. Jia et al., “Controlled Growth of Silicon Dioxide from ‘Nanoholes’ in Silicon-Supported Tris(trimethylsiloxy)silyl Monolayers: Rational Control of Surface Roughness at the Nanometer Length Scale”, Langmuir, vol. 19, pp. 2449-2457 (2003).
B. H. Kim, “A New Organic Modifier for Anti-Stiction”, Journal of Microelectromechanical Systems, vol. 10, No. 1, pp. 33-40 (Mar. 2001).
T. M. Mayer et al., “Chemical vapor deposition of fluoroalkysilane monolayer films for adhesion control in microelectromechanical Systems”, J. Vac. Sci. Technol. B, vol. 18, No. 5, pp. 2433-2440 (Sep./Oct. 2000).
J. Sakata et al., “Anti-Stiction Silanization Coating to Silicon Micro-Structures by a Vapor Phase Deposition Process”, Transducers, pp. 1-4 (1999).
J. Wang et al., “Gold nanoparticulate film bound to silicon surface with self-assembled monolayers”, Thin Solid Films, Elsevier Science S.A., pp. 591-594 (1998).
X. Wang et al., “Gas-Phase Silicon Etching with Bromine Trifluoride”, Transducers, International Conference on Solid State Sensors and Actuators, Chicago, pp. 1505-1508 (June 1997).
Y. Wang et al. “Vapor phase deposition of uniform and ultrathin silanes”, SPIE, vol. 3258, pp. 20-28 (1998).
PCT/US04/18617 International Search Report, mailed Jul. 15, 2005.
W. R. Ashurst et al., “Wafer level anti-stiction coatings for MEMS”, Sensors and Actuators A, Elsevier Science B.V., vol. 104, pp. 213-221 (2003).
Chinn Jeffrey D.
Kobrin Boris
Nowak Romuald
Yi Richard C.
Applied Microstructures, Inc.
Burkhart Elizabeth A
Meeks Timothy
LandOfFree
Method for controlled application of reactive vapors to... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for controlled application of reactive vapors to..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for controlled application of reactive vapors to... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4000644