Method for control of photoresist develop processes

Details Method for control of photoresist develop processes Method for control of photoresist develop processes

1990-05-18

1993-03-23

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 354298, 354317, 354325, G03C 500

Patent

active

051962853

ABSTRACT:
A method for the control of photoresist develop processes employing multiple spray-puddle steps in which process changes other than time, such as endpoint are used to determine the length of the spray and puddle steps.

REFERENCES:
patent: 4136940 (1979-01-01), Lin
patent: 4142107 (1979-02-01), Hatzakis et al.
patent: 4198261 (1980-04-01), Busta et al.
patent: 4317698 (1982-03-01), Christol et al.
patent: 4462680 (1984-07-01), Ikeda
patent: 4469424 (1984-09-01), Matsui et al.
patent: 4501480 (1985-02-01), Matsui et al.
patent: 4564280 (1986-01-01), Fukuda
patent: 4647172 (1987-03-01), Batchelder et al.
patent: 4851311 (1989-07-01), Millis et al.
patent: 4857430 (1989-08-01), Millis et al.
patent: 4922277 (1990-05-01), Carlson et al.
patent: 4982215 (1991-01-01), Matsuoka

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