Method for control of photoresist develop processes

Details Method for control of photoresist develop processes Method for control of photoresist develop processes

1992-10-07

1994-03-08

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 354298, 354317, 354325, 156626, G03C 500

Patent

active

052926052

ABSTRACT:
A method for the control of photoresist develop processes employing multiple spray-puddle steps in which process changes other than time, such as endpoint are used to determine the length of the spray and puddle steps.

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