Method for continuous and maskless patterning of structured subs

Details Method for continuous and maskless patterning of structured subs Method for continuous and maskless patterning of structured subs

1997-12-29

2000-06-20

Pianalto, Bernard

Coating processes

Electrical product produced

Transparent base

427123, 4271263, 427164, 427264, 427265, 427271, 427331, 427404, 4274432, B05D 512

Patent

active

060775602

ABSTRACT:
A method of selectively patterning a structured substrate without using a mask is disclosed. The method includes the steps of providing a surface having a plurality of protrusions, coating the surface with a filler material thick enough so that the protrusions are covered, and planarizing the filler coating. The filler material is thereafter partially removed in a uniform fashion to expose only those portions of the protrusions to be modified. After modifying the protrusions by, for example, deposition or etching, the remaining filler material may be removed, resulting in a structured substrate selectively modified or patterned at its protrusions.

REFERENCES:
patent: 1983720 (1934-12-01), West
patent: 3244556 (1966-04-01), Mytych
patent: 3287161 (1966-11-01), Schwertz et al.
patent: 5268782 (1993-12-01), Wenz et al.
patent: 5378494 (1995-01-01), Thomas et al.
patent: 5382317 (1995-01-01), Thomas
patent: 5538753 (1996-07-01), Antes et al.

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