Wells – Processes – Cementing – plugging or consolidating
Patent
1994-12-01
1996-02-20
Suchfield, George A.
Wells
Processes
Cementing, plugging or consolidating
166300, F21B 33138
Patent
active
054921775
ABSTRACT:
A method for consolidating a subterranean formation to control the production of particulates therefrom. A specific consolidating solution comprised of an allyl monomer and an initiator is injected into the formation where it is allowed to set at an elevated temperature to harden and form a permeable, consolidated mass. The allyl monomer is an allyl ester selected from the group of diallyl orthophthalate, diallyl isophthalate, diallyl terephthalate, diallyl benzenephosphonate, diethylene glycol bis (allyl carbonate) and other known allyl monomers and the initiator is preferably a peroxy compound (e.g. benzoyl peroxide, diisopropyl peroxydicarbonate, etc.) or an azo compound (e.g. 4,4'-azobis(4-cyanovaleric acid). A diluent such as an alcohol (e.g. isopropyl alcohol or isobutyl alcohol) or a mutual solvent (e.g. ethylene glycol monobutyl ether, diacetin, triacetin, acetone, etc.) and a coupling agent (e.g. an organofunctional silane) may be added if needed.
REFERENCES:
patent: 2770306 (1956-11-01), Clark, Jr.
patent: 3176769 (1965-04-01), Treadway et al.
patent: 3412796 (1968-11-01), Dekking
patent: 3719050 (1973-03-01), Asao et al.
patent: 4193453 (1980-03-01), Golinkin
patent: 4875525 (1989-10-01), Mana
patent: 5082057 (1992-01-01), Sydansk
Cox Larry L.
Strom E. Thomas
Yeh Charles S.
Hager Jr. George W.
McKillop Alexander J.
Mobil Oil Corporation
Suchfield George A.
LandOfFree
Method for consolidating a subterranean formation does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for consolidating a subterranean formation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for consolidating a subterranean formation will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1351087