Method for confirming optimum focus of stepper

Details Method for confirming optimum focus of stepper Method for confirming optimum focus of stepper

1997-10-01

1999-07-27

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430 22, G03F 900

Patent

active

059288221

ABSTRACT:
A method for confirming an optimum focus of a stepper. A plurality of photoresist patterns are formed at a predetermined energy while changing focus by use of a reticle of a diagonally asymmetric box-in-box structure. The optimum focus can be obtained by taking advantage of the change of the line width of the photoresist patterns with defocus degrees.

REFERENCES:
patent: 4581316 (1986-04-01), Yamanouchi
patent: 5338630 (1994-08-01), Yoon et al.
patent: 5677091 (1997-10-01), Barr et al.
patent: 5756238 (1998-05-01), Barr et al.
patent: 5776645 (1998-07-01), Barr et al.

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