Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2009-10-05
2010-10-26
Young, Christopher G (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S005000, C382S145000, C382S149000, C716S030000, C716S030000, C716S030000
Reexamination Certificate
active
07820346
ABSTRACT:
This invention relates to a method for collecting an Optical Proximity Correction parameter, which includes: performing an Optical Proximity Correction for a test line containing a non-right turning-angle to generate a to-be-exposed pattern having an assistant line; obtaining, by way of simulation or actual exposure, a formed line generated from the to-be-exposed pattern being exposed; and comparing the formed line with the test line to determine a difference there between so as to determine whether there is a redundant part and/or a missing part in the assistant line at location of the turning-angle of the test line. Being compared with the prior art, this invention sets the non-right turning-angle in the to-be-exposed test line. By comparing the formed line (which is generated by simulation or actual exposure) of the above test line with the test line itself, the redundant part and/or the missing part of the assistant line, as well as proximity data such as the position of the redundant part and/or the missing part and the like, can be obtained. Then, these proximity data can be used to correct and perfect the OPC model having a line containing a non-right turning-angle.
REFERENCES:
patent: 6280887 (2001-08-01), Lu
patent: 6303253 (2001-10-01), Lu
patent: 6329107 (2001-12-01), Lu
patent: 6523162 (2003-02-01), Agrawal et al.
patent: 6767679 (2004-07-01), Hsieh et al.
Semiconductor Manufacturing International (Shanghai) Corporation
Squire Sanders & Dempsey L.L.P.
Young Christopher G
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