Coating processes – Immersion or partial immersion – Running lengths
Patent
1984-10-20
1986-11-04
Lusignan, Michael R.
Coating processes
Immersion or partial immersion
Running lengths
118411, 118412, 156345, 156646, 226 97, 406 86, 4274345, 4272555, B05D 118, B44C 122, C23C 1600
Patent
active
046209972
DESCRIPTION:
BRIEF SUMMARY
The invention relates to a method and installation for applying a coating on a flat surface.
Such method and installation are described in the Dutch Patent Application No. 82 00 753 of the applicant.
In this new Application some improvements are disclosed.
For instance, in the coating supply station the supply of a precisely measured volume of coating per second takes place towards a narrow gap in between the substrate and a very smooth applicator segment.
Thereby the flow restriction of the gap section in the direction, which is opposite to the direction of substrate displacement, is that large, that no coating can leak away in this direction.
In the next section the coating layer, applied on the substrate, is supplemented with an additional layer of thinner or other evaporizable liquid.
Next, in another section a gradual removal of this second layer takes place, and whereby the coating layer cannot come into a mechanical contact with components of the installation.
The other, non-processing side of the substrate moves along a guide wall with a fluid medium cushion in between and whereby the applied coating is separated from the wall section of the succeeding passage area, which over some distance is remote from the substrate, passing through.
This contact-free displacement is maintained until the coating in the following section is dried and whether or not hardened.
Further details follow from the description of the following Figures:
FIG. 1 is a section of a process installation, in which a coating is applied on a substrate, passing through, and whereby thereafter the coating is dried.
FIG. 2 is an enlarged section of the installation for applying a coating according to FIG. 1.
FIG. 3 is the first section of the installation according to FIG. 2.
FIG. 4 is the second section of the installation according to FIG. 2.
FIG. 5 discloses in detail the section for applying the coating.
FIG. 6 discloses in detail the section for applying the thinner.
FIGS. 7, 8 and 9 show in detail the removal of the thinner and the thickening of the applied coating layer.
FIG. 10 is a cross section of an installation for applying a coating at the passage area.
FIG. 11 is a cross section of the housing of the coating applicator.
In FIG. 1 the installation 10 is shown. Thereby in a preceding section 12 a drying of the substrate 14 in the narrow passage 16 has taken place by means of warm gaseous medium, such as nitrogen, which is supplied through channels 18 and discharged through channels 20, see also FIG. 2.
In section 22 the applying of coating 24 on the substrate 14 takes place, and in section 26 the applying of thinner 28.
In section 30 the removal of this thinner 28 and thickening of the applied coating layer occurs, whereas in module 32, which for instance can be a micro-wave oven, a drying and hardening of the coating, applied on the substrate, takes place.
In the next section 34 a second coating layer is applied on the substrate 14, within module 36 a repeated drying and hardening of this second coating layer.
In FIG. 2 the section 22 for applying coating is enlarged also at the passage 16. Through successive channels 18 supply of nitrogen takes place towards the processing side of the substrate 14 and through channels 40 the supply of nitrogen towards the non-processing side of this substrate.
Thereby the extremely smooth and flat segment wall sections 42, 44 and 46 in combination with micro fluid medium cushions 48 and 50 provide a good guidance for the substrate.
Simultaneously with the nitrogen evaporated thinner can be supplied.
Through discharge channels 20 the discharge of supplied fluid medium occurs, whereby such a discharge can be connected with a high vacuum pump.
The supply channels 18 are located in between the nitrogen segments 56 and 58, which are positioned in the lower transporter section 60, whereas the supply channels 40 are located in between the segments 62 and 64 of the upper transporter section 66.
The discharge channels 20 are located in between the successive transporters.
In section 22, see also
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Integrated Automation Limited
Lusignan Michael R.
Olsen Warren E.
Semmes David H.
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