Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Patent
1995-04-21
1997-05-06
Padgett, Marianne
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
427528, 427531, 427131, 427132, 20419216, 2041922, 20419215, C23C 1406, C23C 1408, C23C 1432, B05D 512
Patent
active
056269200
ABSTRACT:
A coated metal-substrate disk for magnetic-recording applications is disclosed having a first coating selected from the group consisting of nitrides, carbides, or borides of titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, or tungsten, or the group consisting of aluminum nitride, silicon nitride, or silicon carbide on the metal substrate and a magnetic-recording material coating on the first coating. The first coatings are applied by evaporative reactive ion plating or by reactive sputtering.
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Nelson Carl W.
Weir Richard D.
Padgett Marianne
Tulip Memory Systems, Inc.
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