Method for coating low viscosity materials

Details Method for coating low viscosity materials Method for coating low viscosity materials

2005-05-10

2005-05-10

Jolley, Kirsten (Department: 1762)

Coating processes

Centrifugal force utilized

C427S299000, C427S352000, C427S425000, C118S052000, C118S320000, C438S780000, C438S782000

Reexamination Certificate

active

06890595

ABSTRACT:
A method for coating low viscosity materials onto a wafer to form a uniform film. After a wafer is rotated at a first rotation speed, coating solution is dispensed onto the wafer. The wafer is decelerated to a second rotation speed at a first deceleration rate to spread the coating solution. Next, the wafer is slowly decelerated to a third rotation speed at a second deceleration rate considerably lower than the first deceleration rate, so the coating solution reflows to the center of the wafer. The wafer is then quickly accelerated to a fourth rotation speed at a third acceleration rate larger than the first deceleration rate to spread the coating solution again.

REFERENCES:
patent: 5405813 (1995-04-01), Rodrigues
patent: 5773082 (1998-06-01), Ku et al.
patent: 5912049 (1999-06-01), Shirley
patent: 5985363 (1999-11-01), Shiau et al.
patent: 5989632 (1999-11-01), Sanada et al.
patent: 6117486 (2000-09-01), Yoshihara
patent: 6387825 (2002-05-01), You et al.
patent: 20030087535 (2003-05-01), Matsuura

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