Method for coating a planar surface of a semiconductor or insula

Details Method for coating a planar surface of a semiconductor or insula Method for coating a planar surface of a semiconductor or insula

1981-12-31

1984-01-24

Andrews, R. L.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

204181E, 204300EC, C25D 1308

Patent

active

044275137

ABSTRACT:
A method for coating a planar surface (5) of a semiconductor or insulator (3) with a polymer film according to a given pattern. The substrate to be coated constitutes one electrode (3) in an electrolytic cell whose electrolyte (2) contains monomers of said polymer. The substrate and the monomers are selected such that electrolytic oxidation or reduction occurs when a voltage is applied across the cell electrodes (3, 4) simultaneous with an area of the surface (5) to be coated being irradiated with radiation having energy larger than the energy gap between the valence band and conduction band of said substrate. The irradiation is performed with a sharply defined beam (10) simultaneous with a relative motion of said beam and the substrate surface (5) thereby making the polymer film of the desired pattern. The polymer, for example, is polypyrrole formed by electro-oxidation of a pyrrole monomer in an electrolytic solution containing pyrrole monomer and tetraethylammonium tetrafluoroborate in acetonitrile.

REFERENCES:
patent: 3501390 (1970-03-01), Turner
patent: 3679572 (1972-07-01), Smith et al.
patent: 3738835 (1973-06-01), Bakos
patent: 3943046 (1976-03-01), De Sorga et al.
patent: 4104064 (1978-08-01), Gruber
Nature, vol. 287, Oct. 16, 1980: A. E. Bell, "Optical Discs for Information Storage", pp. 583-585.
Journal of the Electrochemical Society, vol. 127, No. 10, Noufi, R. et al.: "Protection of n-GaAs Photoanodes with Photoelectrochemically Generated Polypyrrole Films", pp. 2310-2311.

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