Method for closed loop control of chemical vapor deposition proc

Details Method for closed loop control of chemical vapor deposition proc Method for closed loop control of chemical vapor deposition proc

1997-05-14

2000-12-19

Beck, Shrive

Coating processes

Measuring, testing, or indicating

427 9, 4272481, C23C 1652

Patent

active

061624888

ABSTRACT:
The present invention is directed to a method of controlling the application of a surface coating by chemical deposition using a closed loop control on growth rate. The method compares a measure of growth rate against a setpoint for the growth rate and adjusts a primary input parameter in order to drive/maintain the measure of growth rate equal to the setpoint.

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