Method for cleansing and conditioning the skin

Compositions – Compositions containing a single chemical reactant or plural... – Organic reactant

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252542, 252545, 252547, 252DIG16, C11D 930, C11D 948

Patent

active

043035434

ABSTRACT:
Compositions for cleansing and conditioning the skin. The compositions comprise a soap and a conditioning agent which is a salt wherein the cation moiety is a protonated fatty amine or a fatty quaternary ammonium ion and the anion moiety is the anion of a fatty acid soap or an anionic synthetic detergent.

REFERENCES:
patent: 2746928 (1956-05-01), Darragh et al.
patent: 2861955 (1958-11-01), Aylesworth
patent: 2950255 (1960-08-01), Goff
patent: 3186912 (1965-06-01), Beamer
patent: 3408298 (1968-10-01), Baravalle
patent: 3431265 (1969-03-01), Wakeman et al.
patent: 3435039 (1969-03-01), Wakeman et al.
patent: 3560390 (1971-02-01), Gaines
patent: 3640883 (1972-02-01), Gotte
patent: 3663459 (1972-05-01), Yoshida et al.
patent: 3668136 (1972-06-01), Barker
patent: 3687870 (1972-08-01), Muzyczko et al.
patent: 3711414 (1973-01-01), Hewitt
patent: 3838057 (1974-09-01), Nicholas et al.
patent: 3954846 (1976-05-01), Grignard
patent: 4001394 (1977-01-01), Fogel et al.
patent: 4132678 (1979-01-01), Iijima et al.
patent: 4235759 (1980-11-01), Ohbu et al.
Kitchener, J. A., "Surface Forces in the Deposition of Small Particles", J. Soc. Cosmet. Chem., 24, 709-725 (1973).

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