Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1997-02-18
1999-01-05
Powell, William
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
216 69, B44C 122
Patent
active
058557288
ABSTRACT:
A cleaning method for realizing uniform ashing of residues at a high efficiency by uniformly injecting neutral active species directly toward the surfaces of vulcanization residues left on a vulcanization mold is described. The method includes setting a ring-shaped cavity in face-to-face reaction with the inner surfaces of a ring-shaped vulcanization mold in a vacuum treating vessel, transmitting a microwave in the cavity, and emitting the microwave via a number of coupling slots formed in the outer side of the cavity toward the inner surfaces of the vulcanization mold whereupon a reaction gas is injected in the space of the treating vessel between the inner surfaces of the vulcanization mold and the cavity, so that a plasma including a major proportion of neutral active species generated from the reaction gas and the emitted microwave, and the elastomer residue is ashed by means of at least one gas selected from the plasma gas and a neutral active species-containing gas. A microwave generator useful for the method is also described.
REFERENCES:
patent: 4534921 (1985-08-01), Fierkens et al.
patent: 4576692 (1986-03-01), Fukuta et al.
patent: 5312519 (1994-05-01), Sakai et al.
Horiike Yasuhiro
Kato Nobuko
Naito Kazuo
Ohno Shingo
Saitoh Shinji
Bridgestone Corporation
Powell William
LandOfFree
Method for cleaning vulcanization mold does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for cleaning vulcanization mold, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for cleaning vulcanization mold will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-858644