Method for cleaning semiconductor products

Details Method for cleaning semiconductor products Method for cleaning semiconductor products

1993-08-30

1995-01-17

Dean, Richard O.

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 41, C23G 102

Patent

active

053822960

ABSTRACT:
The invention relates to a method for cleaning a semiconductor product of particles accumulated on its surface and of metallic and organic contamination. According to the invention, the washing of the semiconductor product is carried out with an acid-water solution with a dilution ratio between 1:10.sup.6 -1:10.sup.3 advantageously between 1:10.sup.5 -1.0.sup.4. Advantageously the employed acid is for instance hydrochloric acid, nitric acid, acetic acid or hydrofluoric acid.

REFERENCES:
patent: 4917123 (1990-04-01), McConnell et al.

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