Method for cleaning semiconductor devices

Details Method for cleaning semiconductor devices Method for cleaning semiconductor devices

1976-03-09

1976-12-21

Lindsay, Jr., Robert L.

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 2, 156 5, 156 17, B08B 312

Patent

active

039986535

ABSTRACT:
A solution of potassium hydroxide is employed to remove the reaction products of aluminum migrated through silicon-semiconductor material by thermal gradient zone melting processing.

REFERENCES:
patent: 3033710 (1962-05-01), Hightower et al.
patent: 3041226 (1962-06-01), Pennington
patent: 3607477 (1971-09-01), Rao et al.
patent: 3863333 (1975-02-01), Loya

Affiliated with

Also associated with

Rating

Method for cleaning semiconductor devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for cleaning semiconductor devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for cleaning semiconductor devices will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1836915