Method for cleaning gas containing toxic component

Details Method for cleaning gas containing toxic component Method for cleaning gas containing toxic component

1988-08-30

1990-03-20

Russel, Jeffrey E.

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

B01D 5334

Patent

active

049100017

ABSTRACT:
A method for cleaning a gas containing at least one toxic component selected from the group consisting of arsine, phosphine, monosilane, diborane, and hydrogen selenide, which comprises contacting the gas with a cleaning agent containing a molded composition comprising (1) manganese dioxide and (2) cupric oxide, having deposited thereon (3) a silver compound, wherein the weight ratio of cupric oxide to manganese dioxide ranges from 0.2 to 1.2 and the amount of the deposited silver compound ranges from 0.01 to 10.5% by weight based on the cleaning agent. By the cleaning method, the toxic component can be removed from a gas, e.g., air, at high efficiency and at a high rate even in case of sudden leakage of the toxic component out of a bomb.

REFERENCES:
patent: 4535072 (1985-08-01), Kitayama et al.
patent: 4578256 (1986-05-01), Nishino et al.
Patent Abstracts of Japan, vol. 9, No. 200, (C-298), (1923), Aug. 16th, 1985.
European Search Report.

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