Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Patent
1988-06-01
1991-02-26
Russel, Jeffrey E.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
B01D 5334
Patent
active
049960300
ABSTRACT:
A method for cleaning an exhaust gas comprising a base gas and at least one toxic component selected from the group consisting of arsine, phosphine, diborane and hydrogen selenide is disclosed. The method comprises contacting the exhaust gas with a molded cleaning agent having a composition consisting essentially of (1) cupric oxide, (2) manganese dioxide, and (3) at least one metal oxide selected from the group consisting of silicon oxide, aluminum oxide and zinc oxide and having a density of from 0.6 to 1.5 g/ml, said composition having a metal atomic ratio M/(M+Cu+Mn) in the range of from 0.02 to 0.70 and a metal atomic ratio Cu/(Cu+Mn) in the range of from 0.1 to 0.9; wherein Cu represents a number of gram atom of copper; Mn represents a number of gram atom of manganese; and M represents a total number of gram atom of silicon, aluminum and/or zinc, to remove the toxic component from the exhaust gas. The method is effective even at low temperatures below 10.degree. C.
REFERENCES:
patent: 4532115 (1985-07-01), Nishino et al.
patent: 4731333 (1988-03-01), Kitahara et al.
patent: 4743435 (1988-05-01), Kitahara et al.
Patent Abstracts of Japan, vol. 9, No. 200 (C-298) (1923), 16th Aug. 1985.
Akita Noboru
Hiramoto Tadashi
Kitahara Koichi
Sasaki Kohhei
Shimada Takashi
Japan Pionics, Ltd.
Russel Jeffrey E.
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