Method for cleaning deposits from a tank using a surfactant comp

Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

507211, E21B 3305

Patent

active

060004126

ABSTRACT:
A method for removing deposits of heavy hydrocarbonaceous materials and finely divided inorganic particulate matter from a tank using a composition containing an alkyl polyglycoside, an ethoxylated alcohol, a caustic and an alkyl alcohol.

REFERENCES:
patent: 3070162 (1962-12-01), Barnard, Jr.
patent: 3400017 (1968-09-01), Huebner et al.
patent: 3529666 (1970-09-01), Crowe
patent: 3653441 (1972-04-01), Tuttle
patent: 3756319 (1973-09-01), Holm et al.
patent: 3884302 (1975-05-01), Messenger
patent: 4423781 (1984-01-01), Thomas
patent: 4439241 (1984-03-01), Ault et al.
patent: 4528106 (1985-07-01), Grolitzer
patent: 4565647 (1986-01-01), Llenado
patent: 4648453 (1987-03-01), Nagra et al.
patent: 4681164 (1987-07-01), Stacks
patent: 4856589 (1989-08-01), Kuhlman et al.
patent: 4985154 (1991-01-01), Balzer et al.
patent: 5030366 (1991-07-01), Wilson et al.
patent: 5164116 (1992-11-01), Berkhof et al.
patent: 5221343 (1993-06-01), Grauer et al.
patent: 5374361 (1994-12-01), Chan
patent: 5458197 (1995-10-01), Chan
patent: 5466746 (1995-11-01), Geck et al.
patent: 5627144 (1997-05-01), Urfer et al.
patent: 5830831 (1998-11-01), Chan et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for cleaning deposits from a tank using a surfactant comp does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for cleaning deposits from a tank using a surfactant comp, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for cleaning deposits from a tank using a surfactant comp will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-854755

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.