Method for cleaning chamber of deposition apparatus for...

Details Method for cleaning chamber of deposition apparatus for... Method for cleaning chamber of deposition apparatus for...

2006-05-02

2006-05-02

El-Arini, Zeinab (Department: 1746)

Cleaning and liquid contact with solids

Processes

Including regeneration, purification, recovery or separation...

C134S022100, C134S022190, C134S024000, C134S025400, C252S366000, C252S301160, C252S364000, C252S508000

Reexamination Certificate

active

07037380

ABSTRACT:
A compound such as Alq3accumulated on the inner surface of a chamber at the time of organic EL device production and wasted is recovered and recycled, whereby the production cost is reduced. The inner surface of a chamber or the surface of components in the chamber to which a compound such as Alq3has adhered is cleaned with a fluorinated alcohol such as 2,2,3,3,4,4,5,5-octafluoropentanol to recover Alq3.

REFERENCES:
patent: 4530776 (1985-07-01), Hisamoto et al.
patent: 2002/0009037 (2002-01-01), Tamada
patent: 59-157196 (1984-09-01), None
patent: 2-261900 (1990-10-01), None
patent: 6-211718 (1994-08-01), None
patent: 6-346095 (1994-12-01), None
patent: 7-64284 (1995-03-01), None
patent: 2000-353593 (2000-12-01), None
patent: 2001-015267 (2001-01-01), None
patent: 2001-185364 (2001-07-01), None
patent: 2002-151260 (2002-05-01), None

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