Method for cleaning a surface of a substrate

Details Method for cleaning a surface of a substrate Method for cleaning a surface of a substrate

2005-05-24

2005-05-24

Barr, Michael (Department: 1746)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

C134S002000, C134S003000, C134S029000

Reexamination Certificate

active

06896744

ABSTRACT:
A highly efficient method for cleaning a substrate, whereby in the cleaning of the substrate, {circle around (1)} in a short time, {circle around (2)} both particle contaminants and metal contaminants can be removed, and {circle around (3)} a problem associated therewith, such as re-deposition of contaminants or a dimensional change due to etching, can be remarkably reduced, and which has the following characteristics.A method for cleaning a surface of a substrate, which comprises at least the following steps (1) and (2), wherein the step (2) is carried out after carrying out the step (1):Step (1): A cleaning step of cleaning the surface of the substrate with an alkaline cleaning agent containing a completing agent, andStep (2): A cleaning step employing a cleaning agent having a hydrofluoric acid content C (wt %) of from 0.03 to 3 wt %, wherein the cleaning time t (seconds) of the substrate with said cleaning agent is at most 45 seconds, and C and t satisfy the relationship of 0.25≦tC1.29≦5.

REFERENCES:
patent: 5637151 (1997-06-01), Schulz
patent: 5840127 (1998-11-01), Hayashida et al.
patent: 6146467 (2000-11-01), Takaishi et al.
patent: 6296714 (2001-10-01), Matsuo et al.
patent: 6-216098 (1994-08-01), None
patent: 7-86220 (1995-03-01), None
patent: 8-264500 (1996-10-01), None
patent: 2713787 (1998-02-01), None
patent: 10-256211 (1998-09-01), None
patent: 2000-49133 (2000-02-01), None
patent: 2000-91277 (2000-03-01), None
patent: 2000-91289 (2000-03-01), None
patent: 3174823 (2001-06-01), None

Affiliated with

Also associated with

Rating

Method for cleaning a surface of a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for cleaning a surface of a substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for cleaning a surface of a substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3394268