Method for cleaning a surface

Details Method for cleaning a surface Method for cleaning a surface

1997-11-12

1999-10-19

Warden, Jill

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 1, 134 13, 134 3, 134 26, 134 6, 134 28, 134 29, B08B 300, B08B 700

Patent

active

059682809

ABSTRACT:
A surface such as that of a semiconductor wafer is cleaned by contacting the surface with a cleaning composition containing a polyelectrolyte.

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Eitoku, Post-CMP Cleaning technology, Semicon Korea 95, pp. 29-36, Jan. 1995.
Nadahara et al, an SPIE abstract of "Process damage in single-wafer cleaning process" published in Proc. SPIE, vol. 3215, pp. 137-143, Sep. 1997.

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