Method for cleaning a substrate with a composition comprising ra

Details Method for cleaning a substrate with a composition comprising ra Method for cleaning a substrate with a composition comprising ra

1998-03-16

2000-07-25

Meeks, Timothy

Cleaning and liquid contact with solids

Processes

Paints, varnishes, lacquers, or enamels, removal

134 40, 134 26, 134 10, 134 13, 427496, 427499, 427507, 427508, 427520, 427551, 427553, 427307, 427322, C23D 1700

Patent

active

060932570

ABSTRACT:
A method of cleaning a substrate by covering the substrate with a composition in a sufficient amount to clean the substrate. The composition includes a substantial amount of at least one low viscosity organic compound which includes a radiation curable group. The compound is reclaimed for further use. The reclaimed compound may be used as a reactive diluent in a radiation curable coating composition.

REFERENCES:
patent: 4196018 (1980-04-01), Inoko et al.
patent: 5525371 (1996-06-01), Sweeney et al.

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