Method for cleaning a substrate

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

Reexamination Certificate

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C134S015000, C134S021000

Reexamination Certificate

active

08080108

ABSTRACT:
A method for the continuous vacuum cleaning of a substrate, characterized in that:a species is chosen that has a low sputtering efficiency and is chemically active with regard to the soiling matter;using at least one linear ion source, a plasma is generated from a gas mixture comprising predominantly the species having a low sputtering efficiency, especially one based on oxygen; andat least one surface portion of the substrate is subjected to the plasma so that said ionized species at least partly eliminates, by chemical reaction, the soiling matter possibly adsorbed or located on the surface portion.

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Japanese Office Action issued on Feb. 22, 2011 in corresponding Japanese Application No. 2006-550254 (English Translation Only).

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