Method for cleaning a substrate

Details Method for cleaning a substrate Method for cleaning a substrate

2005-01-21

2011-12-20

Kornakov, Michael (Department: 1714)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S015000, C134S021000

Reexamination Certificate

active

08080108

ABSTRACT:
A method for the continuous vacuum cleaning of a substrate, characterized in that:a species is chosen that has a low sputtering efficiency and is chemically active with regard to the soiling matter;using at least one linear ion source, a plasma is generated from a gas mixture comprising predominantly the species having a low sputtering efficiency, especially one based on oxygen; andat least one surface portion of the substrate is subjected to the plasma so that said ionized species at least partly eliminates, by chemical reaction, the soiling matter possibly adsorbed or located on the surface portion.

REFERENCES:
patent: 4891113 (1990-01-01), Criss
patent: 5135775 (1992-08-01), Foller et al.
patent: 5153054 (1992-10-01), Depauw et al.
patent: 5376455 (1994-12-01), Hartig et al.
patent: 2002/0012798 (2002-01-01), Veerasamy
patent: 2002/0117250 (2002-08-01), Veerasamy
patent: 2003/0064198 (2003-04-01), Thomsen et al.
patent: 2003/0077402 (2003-04-01), Amann et al.
patent: 2004/0020761 (2004-02-01), Thomsen et al.
patent: 2004/0163945 (2004-08-01), Hartig
patent: 39 23 685 (1991-01-01), None
patent: 0 456 487 (1991-11-01), None
patent: 0 638 528 (1995-02-01), None
patent: 0 718 250 (1996-06-01), None
patent: 2 836 157 (2003-08-01), None
patent: 56 155526 (1981-12-01), None
patent: 61-250168 (1986-11-01), None
patent: 2-211626 (1990-08-01), None
patent: 2-239135 (1990-09-01), None
patent: 4-229805 (1992-08-01), None
patent: 7-165442 (1995-06-01), None
patent: 7-172872 (1995-07-01), None
patent: 8-238710 (1996-09-01), None
patent: 10-253995 (1998-09-01), None
patent: 2001-331933 (2001-11-01), None
patent: 2002-528372 (2002-09-01), None
patent: 2003-509327 (2003-03-01), None
patent: WO 00/24686 (2000-05-01), None
patent: WO 01/21540 (2001-03-01), None
patent: 01 82355 (2001-11-01), None
patent: WO 03/074440 (2003-09-01), None
patent: WO 2004/005210 (2004-01-01), None
Japanese Office Action issued on Feb. 22, 2011 in corresponding Japanese Application No. 2006-550254 (English Translation Only).

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