Method for cleaning a polysilicon fraction

Details Method for cleaning a polysilicon fraction Method for cleaning a polysilicon fraction

2007-06-18

2010-06-15

Carrillo, Sharidan (Department: 1792)

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

C134S003000, C134S025400, C134S026000, C134S028000, C134S032000, C134S033000, C134S035000, C134S036000, C134S041000, C134S042000, C134S902000

Reexamination Certificate

active

07736439

ABSTRACT:
The present invention relates to a method for cleaning polycrystalline silicon fragments to a metal content of <100 ppbw, wherein a polysilicon fraction is added to an aqueous cleaning solution containing HF and H2O2, this aqueous cleaning solution is removed and the polycrystalline fraction thereby obtained is washed with highly pure water and subsequently dried.

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US 5,846,921 is corresponding to DE 198 17 486 A1.

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