Cleaning and liquid contact with solids – Processes – Using sequentially applied treating agents
Reexamination Certificate
2008-05-27
2008-05-27
Carrillo, Sharidan (Department: 1792)
Cleaning and liquid contact with solids
Processes
Using sequentially applied treating agents
C134S002000, C134S003000, C134S019000, C134S027000, C134S028000, C134S029000, C134S030000, C134S034000, C134S035000, C134S036000, C134S041000, C134S042000, C134S902000
Reexamination Certificate
active
11624275
ABSTRACT:
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.
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patent: 2006/0137717 (2006-06-01), Lee
Cho Hyun Joon
Choi Sang Soo
Kang Han Byul
Kim Jong Min
Kim Yong Dae
Carrillo Sharidan
Much Shelist
PKL Co., Ltd.
Sacharoff Adam K.
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