Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1984-11-02
1985-06-25
Tung, T.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204219, 204225, 204280, 166248, 166311, C23F 1300
Patent
active
045252637
ABSTRACT:
A cathodic protection system for protecting a metallic structure (16, 74) from corrosion caused by current flowing between the structure and surrounding environment includes a non-ionized metal anode (18) which exists in a liquid state at the particular pressure and temperature at its location in a hole (20) in the earth. The liquid anode (18) is composed of a metal having a specific gravity greater than 10 and a molecular weight greater than, or equal to, 100. In a preferred embodiment, it is mercury. The amount of liquid anode can be adjusted to regulate the density of electrical current emanating from the anode and the hole in which the anode is located includes a measuring system (46) for monitoring the quantity of liquid anode (18) in the earth hole.
REFERENCES:
patent: 2120132 (1938-06-01), Hawkins
patent: 2360244 (1944-10-01), McAnneny
patent: 3616354 (1971-10-01), Russell
patent: 3725669 (1973-04-01), Tatum
patent: 3728234 (1972-04-01), Sakai et al.
patent: 3857776 (1974-12-01), Titus et al.
patent: 4013538 (1977-03-01), Schneider et al.
patent: 4170532 (1979-10-01), Tatum
patent: 4201637 (1980-05-01), Peterson et al.
patent: 4204937 (1980-05-01), Bianchi et al.
patent: 4251343 (1981-02-01), Peterson et al.
patent: 4318787 (1982-03-01), Peterson et al.
patent: 4388168 (1983-06-01), Burkhart
patent: 4400259 (1983-08-01), Schutt
Moser David
Parkhurst Warren E.
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