Method for cleaning a ceramic member for use in a system for...

Cleaning and liquid contact with solids – Processes – Using solid work treating agents

Reexamination Certificate

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C134S001000, C134S003000, C134S028000

Reexamination Certificate

active

11032939

ABSTRACT:
The present invention provides a method for cleaning a ceramic member for use in a system for producing semiconductors. The method has the step of cleaning the ceramic member with an organic acid or a weak acid. Preferably, the ceramic member is cleaned with a strong acid before the cleaning with an organic acid or a weak acid. The ceramic member may be subjected to a blasting treatment before the cleaning with an organic acid or a weak acid. According to the method, the amount of metal transferred from the ceramic member to a semiconductor may be considerably reduced.

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U.S. Appl. No. 11/087,094, filed Mar. 22, 2005, Kiku et al.

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